Are you interested in EUV ...?
Node after node, creative use of photomasks with refractive optics continue to delay the arrival of Extreme UV lithography based on reflective optics. Using a wavelength that is more than an order of magnitude smaller than ArF, all photomask substrates become opaque with EUV. A photomask changes from modulating light passing through it to modulating light reflecting off it. Cool stuff ... if it ever gets here. If you're intrigued by the status of EUV, this is the conference for you:
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