Mask Challenges at the 13.5nm wavelength

One of my favorite mask industry analysts is Mark Lapedus at SemiconductorEngineering. In this article, he poses the question: If we solve the EUV source problem, achieve reasonable yields of EUV photoblanks with reflective 40-layer stacks of MoSi, and have a viable pellicle to keep airborne contaminants off the reticle plane, how are we going to inspect these masks?
http://semiengineering.com/19108/

Maybe Kenneth Goldberg (seen below in what possibly could be the industry's first EUV mask selfie, ca 2011) and his team of SHARP scientists at Berkeley Labs have some ideas:
http://newscenter.lbl.gov/2013/06/25/the-semiconductor-industry-gets-a-sharper-vision-of-the-future/